Design and Construction of a Mechatronic Reactor for the Growth of Thin Films by the Dip Coating Technique

Authors

  • A A Velásquez Universidad EAFIT
  • J P Urquijo Universidad de Antioquia
  • Y Gutiérrez Universidad EAFIT

DOI:

https://doi.org/10.17230/ingciencia.10.20.7

Keywords:

Dip coating reactor, mechatronic system, thin films, automation.

Abstract

The design and construction of an automated mechatronic system for the growth of thin films by the dip coating technique is presented. The system consists of a substrate-holder, which performs vertical movements between two adjustable positions. The movement of the substrate holder is controlled by a transmission belt driven by a direct current motor. The ends of the motion of the substrate-holder are sensed by micro-switches placed at the ends of the motion interval. The acquisition of the signal coming from the micro-switches, as well as the generation of the control signal for the motor are performed by a data acquisition card USB 6353rfrom National Instruments. From a graphic interface developed in LabVIEWr, the user can program all parameters of the reactor, among them the immersion and extraction velocities of the substrates and the drying time. Details on the construction and operation tests of the system are described.

PACS: 81.15.-z, 84.30.r

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Author Biographies

  • A A Velásquez, Universidad EAFIT
    Alvaro Velásquez es Físico, Magister en Física y Doctor en Física de la Universidad de Antioquia. Se desempeña como docente de tiempo completo en el Departamento de Ciencias Básicas de la Universidad EAFIT sede Medellín. Es el director de la Línea de Instrumentación adscrita al Grupo de Electromagnetismo Aplicado. Sus áreas de investigación son la instrumentación científica y la espectroscopia Mössbauer.
  • J P Urquijo, Universidad de Antioquia
    Química y Magister en Química, egresada de la Universidad de Antioquia. Actualmente se encuentra finalizando sus estudios de Doctorado en Ciencias Químicas en la Universidad de Antioquia con el Grupo de Estado Sólido. Su área de investigación principal es la síntesis de óxidos de hierro nanoestructurados por rutas húmedas.
  • Y Gutiérrez, Universidad EAFIT
    Ingeniero Físico egresado de la Universidad EAFIT sede Medellín, es estudiante de la Maestría en Física Aplicada de la misma universidad y miembro del Grupo de Electromagnetismo Aplicado. Sus áreas de investigación son la Física del Estado Sólido y la instrumentación científica.

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Published

2014-03-27

Issue

Vol. 10 No. 20 (2014)

Section

Articles

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How to Cite

Velásquez, A. A., Urquijo, J. P., & Gutiérrez, Y. (2014). Design and Construction of a Mechatronic Reactor for the Growth of Thin Films by the Dip Coating Technique. Ingeniería Y Ciencia, 10(20), 93-113. https://doi.org/10.17230/ingciencia.10.20.7

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