Fabrication and Characterization of Alq3 Thin Films
DOI:
https://doi.org/10.17230/ingciencia.10.20.3Keywords:
thin film, thermal evaporation, substrate, characterization, organic semiconductorAbstract
Alq3 (tris (8-hydroxyquinolate) aluminum) thin films were deposited on glass by thermal evaporation in order to establish the optimal evaporation
rates of thin films deposited between 30 to 120nm on a substrate with temperatures between 60 and 120°C. The thin films were characterized by SEM microscopy and perfilometry to compare the obtained thickness in-situ by quartz crystals; furthermore photoluminescence measures were made.
PACS: 73.55.k2, 7855.-m, 06.60Sx, 07.30.Kf.
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