Structural and Morphological Properties of Titanium Aluminum Nitride Coatings Produced by Triode Magnetron Sputtering
DOI:
https://doi.org/10.17230/ingciencia.10.20.4Keywords:
TiAlN, bias voltage, sputtering, Atomic percentage, XRD.Abstract
TixAl1-xN coatings were grown using the triode magnetron sputtering technique varying the bias voltage between -40 V and -150V. The influence of bias voltage on structural and morphological properties was analyzed by means of energy dispersive spectroscopy, x-ray diffraction and atomic force microscopy techniques. As the bias voltage increased, an increase in the Al atomic percentage was observed competing with Ti and producing structural changes. At low Al concentrations, the film presented a FCC crystalline structure; nevertheless, as Al was increased, the structure presented a mix of FCC and HCP phases. On the other hand, an increase in bias voltage produced a decrease films thickness due to an increase in collisions. Moreover, the grain size and roughness were also strongly influenced by bias voltage.
PACS:61.05.cp
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M. Keunecke, C. Stein, K. Bewilogua, W. Koelker, D. Kassel, and H. van den Berg, “Modified TiAlN coatings prepared by d.c. pulsed magnetron sputtering,” Surface and Coatings Technology, vol. 205, pp. 1273–1278, 2010.
G. S. Fox-Rabinovich, G. C.Weatherly, A. I. Dodonov, A. I. Kovalev, L. Shuster, S. C. Veldhuis, G. K. Dosbaeva, D. L. Wainstein, and M. S. Migranov, “Nano-crystalline filtered arc deposited (FAD) TiAlN PVD coatings for highspeed
machining applications,” Surface and Coatings Technology, vol. 177-178, pp. 800–811, 2004.
H. K. Tönshoff, B. Karpuschewski, A. Mohlfeld, and H. Seegers, “Influence of subsurface properties on the adhesion strength of sputtered hard coatings,” Surface and Coatings Technology, vol. 116–119, pp. 524–529, 1999.
S. K. Wu, H. C. Lin, and P. L. Liu, “An investigation of unbalancedmagnetron sputtered TiAlN films on SKH51 high-speed steel,” Surface and Coatings Technology, vol. 124, pp. 97–103, 2000.
D.-Y. Wang, Y.-W. Li, and W.-Y. Ho, “Deposition of high quality (Ti,Al)N hard coatings by vacuum arc evaporation process,” Surface and Coatings Technology, vol. 114, pp. 109–113, 1999.
B. Subramanian, R. Ananthakumar, and M. Jayachandran, “Microstructural, mechanical and electrochemical corrosion properties of sputtered titaniumaluminum-nitride films for bio-implants,” Surface and Coatings Technology, vol. 85, pp. 601–609, 2010.
E. Lugscheider, F. L. O. Knotek, C. Barimani, S. Guerreiro, and H. Zimmermann, “Deposition of arc TiAlN coatings with pulsed bias,” Surface and Coatings Technology, vol. 76–77, pp. 700–705, 1995.
Y. P. Kathuria and Y. Uchida, “Pulsed Nd-YAG laser deposition of TiN and TiAlN coating,” Physics Procedia, vol. 12, pp. 506–511, 2011.
Y. Q.Wei, C. W. Li, C. Z. Gong, X. B. Tian, and S. Q. Yang, “Microstructure and mechanical properties of TiN/TiAlN multilayer coatings deposited by arcion plating with separate targets,” Transactions of Nonferrous Metals Society
of China, vol. 21, pp. 1068–1073, 2011.
J. L. R. M. L. C. Fontana, “Characteristics of triode magnetron sputtering: the morphology of deposited titanium films,” Surface and Coatings Technology, vol. 107, pp. 24–30, 1998.
P. Panjan, B. Navinsek, M. Cekada, and A. Zalar, “Oxidation behaviour of TiAlN coatings sputtered at low temperature,” Vacuum, vol. 53, pp. 127–131, 1999.
H. C. Barshilia, A. Ananth, J. Khan, and G. Srinivas, “ Ar + H2 plasma etching for improved adhesion of PVD coatings on steel substrates ,” Vacuum, vol. 86, pp. 1165–1173, 2012.
M. Panjan, M. Cekada, P. Panjan, F. Zupani, and W. Kölker, “Dependence of microstructure and hardness of TiAlN/VN hard coatings on the type of substrate rotation,” Vacuum, vol. 86, pp. 699–702, 2012.
G. Greczynski, M. J. J. Lu, J. Jensen, I. Petrov, J. Greene, and L. Hultman, “Selection of metal ion irradiation for controlling Ti1
M. Pfeiler, K. Kutschej, M. Penoy, C. Michotte, C. Mitterer, and M. Kathrein, “The influence of bias voltage on structure and mechanical/ tribological properties of arc evaporated Ti-Al-V-N coatings,” Surface and Coatings Technology, vol. 202, pp. 1050–1054, 2007.
M. Ahlgren and H. Blomqvist, “Influence of bias variation on residual stress and texture in TiAlN PVD coatings,” Surface and Coatings Technology, vol. 200, pp. 157–160, 2005.
I. Petrov, P. B. Barna, L. Hultman, and J. E. Greene, “Microstructural evolution during film Growth,” Journal of Vacuum Science & Technology A, vol. 21, pp. 117–128, 2003.
H. Ljungcrantz, L. Hultman, and J.-E. Sundgren, “Ion induced stress generation in arc-evaporated TiN films,” Journal of Applied Physics, vol. 78, pp. 832–837, 1995.
K. Sato, N. Ichimiya, A. Kondo, and Y. Tanaka, “Microstructure and mechanical properties of cathodic arc ion-plated (Al,Ti)N coatings,” Surface and Coatings Technology, vol. 163–164, pp. 135–143, 2003.
Y. Q. Wei and C. Z. Gong, “Effects of pulsed bias duty ratio on microstructure and mechanical properties of TiN/TiAlN multilayer coatings,” Applied Surface Science, vol. 257, pp. 7881–7886, 2011.
W. Grzesik, Z. Zalisz, S. Krol, and P. Nieslony, “Investigations on friction and wear mechanisms of the PVD-TiAlN coated carbide in dry sliding against steels and cast iron,” Wear, vol. 261, pp. 1191–1200, 2006.
A. A. C. Recco, I. C. Oliveira, M. Massi, H. S. Maciel, and A. P. Tschiptschin, “Adhesion of reactive magnetron sputtered TINx and TICy coatings to AISI H13 tool steel,” Surface and Coatings Technology, vol. 202, pp. 1078–1083, 2007.
D. Devia, E. Restrepo-Parra, P. Arango, A. Tschiptschin, and J. Velez, “TiAlN coatings deposited by triode magnetron sputtering varying the bias voltage,” Applied Surface Science, vol. 257, pp. 6181–6185, 2011.
L. Zhu, M. Hu, W. Ni, and Y. Liu, “High temperature oxidation behavior of Ti0:5Al0:5N coating and Ti0:5Al0:4Si0:1N coating,” Vacuum, vol. 86, pp. 1795–1799, 2012.
R. Wuhrer and W. Y. Yeung, “Grain refinement with increasing magnetron discharge power in sputter deposition of nanostructured titanium aluminium nitride coatings,” Scripta Materialia, vol. 50, pp. 813–818, 2004.
P. H. MAyrhofer, D. Music, and J. M. Schneider, “Ab initio calculated binodal and spinodal of cubic Ti1-xAlxN,” Journal of Applied Physics, vol. 100, pp. 0–0, 2006.
S. Paldey and S. C. Deevi, “Properties of single layer and gradient (Ti,Al)N coatings ,” Materials Science and Engineering: A, vol. 361, pp. 1–8, 2003.
N. Saoula, K. Henda, and R. Kesri, “Influence of Nitrogen Content on the Structural and Mechanical Properties of TiN Thin Films,” Journal of Plasma and Fusion Research, vol. 8, pp. 1403–1407, 2009.
L. Yate, J. C. C. A. H. Macias, F. J. Espinoza-Beltrán, G. Zambrano, J. M. noz Saldaña, and P. Prieto, “Composition and mechanical properties of AlC, AlN and AlCN thin films obtained by r.f. magnetron sputtering,” Surface and Coatings Technology, vol. 203, pp. 1904–1907, 2009.
H. Jiménez, D. M. Devia, V. Benavides, A. Devia, Y. C. Arango, P. Arango, and J. M. Velez, “Thermal protection of H13 steel by growth of (TiAl)N films by PAPVD pulsed arc technique,” Materials Characterization, vol. 59, pp. 1070–1077, 2008.
B.-Y. Shew, J.-L. Huang, and D.-F. Lii, “Effects of r.f. bias and nitrogen flow rates on the reactive sputtering of TiA1N films,” Thin Solid Films, vol. 293, pp. 212–219, 1997.
L. Chen, Y. Du, S. Q. Wang, and J. Li, “ A comparative research on physical and mechanical properties of (Ti, Al)N and (Cr, Al)N PVD coatings with high Al content,” International Journal of Refractory Metals and Hard Materials, vol. 25, pp. 400–404, 2007.
R. F. Bunshah, “Handbook of Hard Coatings,” William Andrew Publishing/ Noyes, vol. 1, p. NewYork, 2001. 61, 62
Z. X. Song, K. W. Xu, and H. Chen, “The characterization of Zr-Si-N diffusion barrier films with different sputtering bias voltage,” Thin Solid Films, vol. 468, pp. 203–207, 2004.
Y. Lv, L. Ji, X. Liu, H. Li, H. Zhou, and J. Chen, “Influence of substrate bias voltage on structure and properties of the CrAlN films deposited by unbalanced magnetron sputtering,” Applied Surface Science, vol. 258, pp. 3864–3870, 2012.
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