Influencia de la temperatura del sustrato en la microestructura de recubrimientos de TiN/TiC

Main Article Content

D M Devia
Fernando Mesa
Pedro José Arango

Keywords

Arco pulsado, Microestructura, TiN/TiC, XPS, XRD

Resumen

Las bicapas de TiN/TiC se depositaron utilizando la técnica de deposición en fase vapor asistido por plasma (PAPVD)-Arco Pulsado, variando la temperatura del sustrato en un rango de 100-120±C, con intervalos de 5±C. Los recubrimientos se analizaron por medio de XPS y XRD. A partir del tratamiento de las señales de los espectros angostos de XPS y los patrones de XRD, se determino la formación de los compuestos TiN (Nitruro de Titanio), TiC (Carburo de Titanio) y TiCN (carbonitruro de titanio) en la fase cristalográfica fm-3m correspondiente a las fases FCC de estos compuestos sintetizados.

PACS: 68.35.Ct, 68.55.A-, 68.65.Ac

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