Structural and Morphological Properties of Titanium Aluminum Nitride Coatings Produced by Triode Magnetron Sputtering
Main Article Content
Keywords
TiAlN, bias voltage, sputtering, Atomic percentage, XRD.
Abstract
TixAl1-xN coatings were grown using the triode magnetron sputtering technique varying the bias voltage between -40 V and -150V. The influence of bias voltage on structural and morphological properties was analyzed by means of energy dispersive spectroscopy, x-ray diffraction and atomic force microscopy techniques. As the bias voltage increased, an increase in the Al atomic percentage was observed competing with Ti and producing structural changes. At low Al concentrations, the film presented a FCC crystalline structure; nevertheless, as Al was increased, the structure presented a mix of FCC and HCP phases. On the other hand, an increase in bias voltage produced a decrease films thickness due to an increase in collisions. Moreover, the grain size and roughness were also strongly influenced by bias voltage.
PACS:61.05.cp
Downloads
References
[2] G. S. Fox-Rabinovich, G. C.Weatherly, A. I. Dodonov, A. I. Kovalev, L. Shuster, S. C. Veldhuis, G. K. Dosbaeva, D. L. Wainstein, and M. S. Migranov, “Nano-crystalline filtered arc deposited (FAD) TiAlN PVD coatings for highspeed
machining applications,” Surface and Coatings Technology, vol. 177-178, pp. 800–811, 2004.
[3] H. K. Tönshoff, B. Karpuschewski, A. Mohlfeld, and H. Seegers, “Influence of subsurface properties on the adhesion strength of sputtered hard coatings,” Surface and Coatings Technology, vol. 116–119, pp. 524–529, 1999.
[4] S. K. Wu, H. C. Lin, and P. L. Liu, “An investigation of unbalancedmagnetron sputtered TiAlN films on SKH51 high-speed steel,” Surface and Coatings Technology, vol. 124, pp. 97–103, 2000.
[5] D.-Y. Wang, Y.-W. Li, and W.-Y. Ho, “Deposition of high quality (Ti,Al)N hard coatings by vacuum arc evaporation process,” Surface and Coatings Technology, vol. 114, pp. 109–113, 1999.
[6] B. Subramanian, R. Ananthakumar, and M. Jayachandran, “Microstructural, mechanical and electrochemical corrosion properties of sputtered titaniumaluminum-nitride films for bio-implants,” Surface and Coatings Technology, vol. 85, pp. 601–609, 2010.
[7] E. Lugscheider, F. L. O. Knotek, C. Barimani, S. Guerreiro, and H. Zimmermann, “Deposition of arc TiAlN coatings with pulsed bias,” Surface and Coatings Technology, vol. 76–77, pp. 700–705, 1995.
[8] Y. P. Kathuria and Y. Uchida, “Pulsed Nd-YAG laser deposition of TiN and TiAlN coating,” Physics Procedia, vol. 12, pp. 506–511, 2011.
[9] Y. Q.Wei, C. W. Li, C. Z. Gong, X. B. Tian, and S. Q. Yang, “Microstructure and mechanical properties of TiN/TiAlN multilayer coatings deposited by arcion plating with separate targets,” Transactions of Nonferrous Metals Society
of China, vol. 21, pp. 1068–1073, 2011.
[10] J. L. R. M. L. C. Fontana, “Characteristics of triode magnetron sputtering: the morphology of deposited titanium films,” Surface and Coatings Technology, vol. 107, pp. 24–30, 1998.
[11] P. Panjan, B. Navinsek, M. Cekada, and A. Zalar, “Oxidation behaviour of TiAlN coatings sputtered at low temperature,” Vacuum, vol. 53, pp. 127–131, 1999.
[12] H. C. Barshilia, A. Ananth, J. Khan, and G. Srinivas, “ Ar + H2 plasma etching for improved adhesion of PVD coatings on steel substrates ,” Vacuum, vol. 86, pp. 1165–1173, 2012.
[13] M. Panjan, M. Cekada, P. Panjan, F. Zupani, and W. Kölker, “Dependence of microstructure and hardness of TiAlN/VN hard coatings on the type of substrate rotation,” Vacuum, vol. 86, pp. 699–702, 2012.
[14] G. Greczynski, M. J. J. Lu, J. Jensen, I. Petrov, J. Greene, and L. Hultman, “Selection of metal ion irradiation for controlling Ti1